Pengaruh Temperatur Deposisi terhadap Struktur dan Sifat Optik Film Tipis ZnO:Al dengan metode DC Magnetron Sputtering
(1) Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Negeri Semarang, Kampus Sekaran, Gunung Pati, Semarang, 50229
(2) Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Negeri Semarang, Kampus Sekaran, Gunung Pati, Semarang, 50229
(3) Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Negeri Semarang, Kampus Sekaran, Gunung Pati, Semarang, 50229
(4) Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Negeri Semarang, Kampus Sekaran, Gunung Pati, Semarang, 50229
(5) Jurusan Fisika, Fakultas Matematika dan Ilmu Pengetahuan Alam Universitas Negeri Semarang, Kampus Sekaran, Gunung Pati, Semarang, 50229
Abstract
Film tipis zinc oxide doping aluminium (ZnO:Al) telah dideposisikan di atas substrat corning glass dengan metode DC magnetron sputtering. Penumbuhan dilakukan dengan memvariasi temperatur deposisi (27°C, 200oC, 300oC, dan 400°C). Analisis X-ray diffraction (XRD) menunjukkan struktur kristal wurtzite dengan orientasi sumbu-c. Ukuran butir kristal meningkat dari 35 nm sampai 52 nm. Analisis scanning electron microscopy (SEM) menunjukkan bahwa ukuran butir bertambah besar dengan bertambahnya temperatur deposisi. Peningkatan temperatur deposisi juga menyebabkan peningkatan nilai transmitansi dari 70% sampai 83% dengan tepi absorpsi pada panjang gelombang sekitar 380 nm.
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