KARAKTERISTIK MAGNETIK LAPISAN TIPIS NI-FE  SEBAGAI FLAT CORE FLUX GATE SENSOR

B. Purnama; H.S.B.R. Prihanto; D.S. Artono; Suharyana -

doi:10.15294/jpfi.v9i2.3039

KARAKTERISTIK MAGNETIK LAPISAN TIPIS NI-FE SEBAGAI FLAT CORE FLUX GATE SENSOR

B. Purnama⁽¹⁾, H.S.B.R. Prihanto⁽²⁾, D.S. Artono⁽³⁾, Suharyana -⁽⁴⁾,

DOI: https://doi.org/10.15294/jpfi.v9i2.3039

(1) Jl. Ir. Sutami 36A Kentingan Surakarta 57126
(2) Jurusan Fisika FMIPA Universitas Sebelas Maret
(3) Jurusan Fisika FMIPA Universitas Sebelas Maret
(4) Jurusan Fisika FMIPA Universitas Sebelas Maret

Abstract

ABSTRAK
Karakteristik magnetik lapisan tipis Ni-Fe hasil elektrodeposisi sebagai flat core flux gate sensor didiskusikan pada makalah ini. Lapisan tipis Ni-Fe dideposisi di atas substrat printed circuit board (PCB) dengan variasi komposisi Ni dan rapat arus J. Untuk memperoleh kualitas lapisan tipis yang baik, zat aditif vanily digunakan untuk mengurangi laju deposisi untuk keseluruhan ekperimen. Hasil menunjukkan modifikasi karakteristik magnetik hasil vibrating sample magnetometer karena perubahan parameter penumbuhannya. Koersif field (Hc) meningkat dengan kenaikan prosentase komposisi Ni pada lapisan tipis yang terbentuk. Sedangkan Hc tidak membentuk pola tertentu dengan modifikasi apat arus J. Akhirnya magnetisasi jenuh maksimum mS = 0.72 emu/gr diperoleh untuk prosentase Ni = 51%, dan mS = 0.43 emu/gr untuk J = 5 mA/cm2. Klarifikasi dengan STM, hal ini akibat perubahan struktur mikroskopik lapisan tipis Ni-Fe.
ABSTRACT
This paper discusses magnetic characteristic of Ni-Fe permalloy thin film produced by electro deposited as flat core flux gate sensor. Ni-Fe thin films were deposited on printed circuit board (PCB) substrates with variation of composition in Ni percentage and current density J. In order to obtain high quality thin films, an additive ingredient of vanily was used to reduce rate deposition for whole experimental procedure. Experiment results showed that modified of magnetic characteristic evaluated by vibrating sample magnetometer was caused by the modified of deposition parameters. Coersive field (Hc) increased with the increase of percentage of Ni composition, while the Hc did not form any particular pattern by modifying current density J. Finally, maximum saturated magnetization mS = 0.72 emu/gr was attained for percentage Ni of 51% and mS = 0.43 emu/gr for J = 5 mA/cm2. Clarification by using STM showed that this was caused by the change of microscopic structure in Ni-Fe thin films.

Keywords

electrodeposition; Ni-Fe thin films; flat core flux gate sensor

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